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changes.mady.by.user Oh, Sung-jae

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changes.mady.by.user VAN MEULEBEKE, Guy

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Main Applications
APPLICATIONS

THEORY, KNOWLEDGE, &

MODEL

MODELS

CAPABILITIES

Semiconductor

Manufacturing

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Coatings of photosensitive materials for circuit construction
(Front-end and back-end process)

Dielectric layer for IC packaging process

Display Panel
Manufacturing

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  • Film transistor, color filter patterning
    • Passivation ,insulation layer patterning

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    1. Electronic circuit formation

    2. Dielectric layer formation

    Display

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    1.  Transistor and color filter

    2. RGB layer formation
    (Color Resist)


    TheoryPatterningPhotolithography
    Process
    		Coating
    1. Spin coating
    2. Softbake
    UV exposure
    1. Mask alignment
    2. UV Exposure
    Develop 
    1. Develop
    Materials
    1. General Photoresist
    2. Photo sensitive Polyimide
    Core Equipment at ADL Ewha site
    1. Spin coating on Substrate
    2. Mask Alignment and UV Exposure
    3. Develop


    Core Competitiveness at ADL Ewha
    Evaluation Data Library
    Current Project Introduction
    1. Photo Sensitive Material Formulation Testing
    2. Coating and Patternability Evaluation
    3. Analysis and Reliability Testing
    Commercialized ProductsAZ series, JSR Series
    Customized Products
    NoProject Title
    1Photo Sensitive PI development at Ewha ADL Team 
    2
    3