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APPLICATIONS

THEORY, KNOWLEDGE, & MODELS

Main ApplicationsTheory of Process and Materials

CAPABILITIES

Semiconductor

Image Modified

1. Electronic circuit formation

2. Dielectric layer formation

Display

Image Modified

1.  Transistor and color filter

2. RGB layer formation
(Color Resist)


TheoryPatterningPhotolithography
Process
Coating
  1. Spin coating
  2. Softbake
UV exposure
  1. Mask alignment
  2. UV Exposure
Develop 
  1. Develop
Materials
  1. General Photoresist
  2. Photo sensitive Polyimide
Equipment and Hand-on Experience4.
Core Equipment at ADL Ewha site
1. Spin coating on Substrate
2. Mask Alignment and UV Exposure
3. Develop


Core Competitiveness at ADL Ewha
Evaluation Data Library
Best Practice Case
Current Project Introduction
  1. Photo Sensitive Material Formulation Testing
2. Coating and Patternability Evaluation
3. Analysis and Reliability Testing
Commercialized ProductsAZ series, JSR Series
Customized Products
NoProject Title
1Photo Sensitive PI development at Ewha ADL Team 
2
3