SMain Applications
Theory of Process and Materials
CAPABILITIES

Semiconductor

1. Electronic circuit formation

2. Dielectric layer formation

Display

1.  Transistor and color filter

2. RGB layer formation
(Color Resist)


TheoryPatterningPhotolithography
Process
Coating
  1. Spin coating
  2. Softbake
UV exposure
  1. Mask alignment
  2. UV Exposure
Develop 
  1. Develop
Materials
  1. General Photoresist
  2. Photo sensitive Polyimide
Core Equipment at ADL Ewha site
1. Spin coating on Substrate
2. Mask Alignment and UV Exposure
3. Develop


                               Special Technique
Evaluation Data Library
Current Project Introduction

4. Evaluation Data Library

Commercialized ProductsAZ series, JSR Series
Customized Products

Photo Sensitive PI development at Ewha ADL Team