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Main Applications
Theory of Process and Materials
CAPABILITIES

Semiconductor

1. Electronic circuit formation

2. Dielectric layer formation

Display

1.  Transistor and color filter

2. RGB layer formation (Color Resist)


TheoryPatterningPhotolithography
Process
Coating
  1. Spin coating
  2. Softbake
UV exposure
  1. Mask alignment
  2. UV Exposure
Develop 
  1. Develop
Materials
  1. General Photoresist
  2. Photo sensitive Polyimide
Equipment and Hand-on Experience
1. Spin coating on Substrate
2. Mask Alignment and UV Exposure
3. Develop
4. Evaluation Data Library

Ewha ADL Team meet the customer requirements with better pattern performance

Best Practice Case


Current Project Introduction



Photo Sensitive PI development at Ewha ADL Team 

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