| SMain Applications |
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| Theory of Process and Materials |
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| CAPABILITIES |
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| Theory | Patterning | Photolithography |
| Process | Coating | |
| UV exposure | ||
| Develop | ||
| Materials | ||
| Core Equipment at ADL Ewha site |
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| 1. Spin coating on Substrate |
| 2. Mask Alignment and UV Exposure |
| 3. Develop |
| Special Technique |
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| Evaluation Data Library |
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| Current Project Introduction |
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| Commercialized Products | AZ series, JSR Series |
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| Customized Products |